Method of Removing Inorganic Scales

ABSTRACT

The productivity of hydrocarbons from hydrocarbon-bearing calcareous or siliceous formations is enhanced by contacting the formation with a well treatment composition which contains a hydrofluoric acid source, a boron containing compound and a phosphonate acid, ester or salt thereof.

This application is a continuation of U.S. patent application Ser. No.11/901,578, filed on Sep. 18, 2007, now U.S. Pat. No. 7,781,381.

FIELD OF THE INVENTION

The invention relates to a method of stimulating or remediatingsiliceous and calcareous formations by use of a well treatmentcomposition which contains a boron containing compound, a phosphonateacid, ester or salt and a hydrofluoric acid source.

BACKGROUND OF THE INVENTION

In the course of drilling, or during production or workover, the vastmajority of oil and gas wells are exposed to conditions that ultimatelylead to formation damage. Formation damage limits the productive (orinjective) capacity of the well. The reduction in well performance isgenerally due to changes in near-wellbore permeability which may becaused by a number of factors, such as rock crushing, invasion of drillsolids, swelling of pore-lining clays, migration of mobile fines andchanges in wettability.

It is known that permeability impairment may be improved by injectingacid formulations containing HF into the formation. Such methods areknown to improve production from both subterranean calcareous andsiliceous formations.

Most sandstone formation are composed of over 70% sand quartz, i.e.silica, bonded together by various amount of cementing materialincluding carbonate, dolomite and silicates. Suitable silicates includeclays and feldspars. A common method of treating sandstone formationsinvolves introducing hydrofluoric acid into the wellbore and allowingthe hydrofluoric acid to react with the surrounding formation.Hydrofluoric acid exhibits high reactivity towards siliceous minerals,such as clays and quartz fines. For instance, hydrofluoric acid reactsvery quickly with authigenic clays, such as smectite, kaolinite, illiteand chlorite, especially at temperatures above 150° F. As such,hydrofluoric acid is capable of attacking and dissolving siliceousminerals.

Upon contact of hydrofluoric acid with metallic ions present in theformation, such as sodium, potassium, calcium and magnesium, undesirableprecipitation reactions occur. For example, during the treatment ofcalcareous or siliceous formations containing carbonate or dolomite,calcium or magnesium fluoride scales often form as a result ofprecipitation. Such scales tend to plug the pore spaces and reduce theporosity and permeability of the formation.

Alternative methods of treating calcareous or siliceous formations withhydrofluoric acid have been sought wherein the formation of undesirablescales is prevented or inhibited.

SUMMARY OF THE INVENTION

Subterranean sandstone or siliceous formations and calcareous formationspenetrated by oil, gas or geothermal wells may be treated with anaqueous well treatment composition containing a hydrofluoric acid sourcein combination with a boron containing compound and a phosphonate acid,ester or salt. Such compositions have been shown to increase thepermeability of the formation being treated by inhibiting or preventingthe formation of undesirable inorganic scales, such as calcium fluoride,magnesium fluoride, potassium fluorosilicate, sodium fluorosilicate,fluoroaluminate, etc. As a result, production from the formation isincreased or improved.

The boron containing compound for use in the composition defined hereinis preferably fluoroboric acid or a boron compound which is capable ofbeing hydrolyzed to form a BF₄ ⁻ complex when exposed to F⁻ or ahydrofluoric acid source.

While the hydrofluoric acid source may be hydrofluoric acid, it moretypically is prepared in-situ in the aqueous system by the reaction ofhydrochloric acid and ammonium bifluoride or ammonium fluoride. In thecurrent invention, an excess of ammonium bifluoride or ammonium fluorideis used such that all of the hydrochloric acid is consumed in theproduction of hydrofluoric acid, leaving a small amount of unconvertedammonium bifluoride or ammonium fluoride.

The phosphonate of the well treatment composition is preferably aphosphonate acid, ester or salt thereof, such as those of the formula:

wherein R1, R2 and R3 are independently selected from hydrogen, alkyl,aryl, phosphonic, phosphonate, phosphate, aminophosphonic,aminophosphonate, acyl, amine, hydroxy and carboxyl groups and saltsthereof and R4 and R5 are independently selected from hydrogen, sodium,potassium, ammonium or an organic radical.

The pH of the composition is typically maintained at a range of 0.5 to2.5. This aids in the inhibition of inorganic scales and in mostinstances the prevention of formation of the undesirable scales.Additionally, it will minimize corrosion potential on downhole metaltubulars

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Inorganic fluoride scales, formed during well treatments withhydrofluoric acid, may be controlled by treating the subterraneanformation penetrated by the well with an aqueous well treatmentcomposition which contains a hydrofluoric acid source, a boroncontaining compound and a phosphonate compound. The boron containingcompound principally functions to inhibit or prevent the formation offluoride scales or to remove such scales from wellbores, screens orother equipment and/or pipelines. The phosphonate compound principallyfunctions as a stabilizer.

In a preferred embodiment, the boron containing compound is fluoroboricacid or tetrafluoroboric acid of the formula BF₄ ⁻H⁺.

The boron containing compound may further be an acid soluble boric acidand/or an organic boron containing compound, including those which arecapable of forming a BF⁻ complex when hydrolyzed and exposed to F⁻ or HFcontaining solution. The reaction, where the boron containing compoundis boric acid, may be represented by the equation:

4HF+H₃BO₃→BF₄ ⁻+H₃O⁺+2H₂O  (I).

The formation of BF₄ ⁻ controls the concentration of active HF at anygiven time. Borate esters further acid hydrolyze to boric acid whichtender the BF₄ ⁻ complex, as set forth by equation (I) above. Hydrolysismay not occur, however, until higher than ambient temperatures arereached. For instance, hydrolysis may not occur until formationtemperature is reached or sufficient heat is generated from the acidreaction.

Suitable boron containing compounds include boric acid, H₃BO₃ as well asesters of boric acid. Preferred as the boron containing compounds arethose of the formula R₆R₇R₈BO₃ wherein each of R₆, R₇ and R₈ areindependently hydrogen or a unsubstituted or substituted alkyl oralkylene group, and is preferably independently selected from hydrogenor C₁-C₄ alkyl group, optionally substituted with one or more —OHgroups. Preferred boron compounds include tributyl borate which is verymoisture sensitive.

Also preferred are tetraborates, such as sodium tetraborate. Boricoxide, B₂O₃, metaboric acid and HBO₂ are further preferred since theyeasily hydrolyze to boric acid, B(OH)₃.

Boric acid reacts rapidly with polyols, glycerol α-hydroxycarboxylicacids, cis-1,2-diols, cis-1,3-diosl, o-quinols, o-catechol and mannitolto form ether type complexes. For instance, three molecules of water aregenerated with mannitol and the last proton, H⁺, is associated with themolecule which can be quantitatively titrated with NaOH. In the presenceof HF, such compounds would readily form the BF₄ ⁻ complex.

Further preferred boron containing compounds are cyclic borate esters,such as those of the formula:

wherein each of R₉, R₁₀, R₁₁, R₁₂, R₁₃, R₁₄, R₁₅ and R₁₆ isindependently selected from hydrogen or a substituted or unsubstitutedalkyl or alkenyl group, and is preferably independently selected fromhydrogen or a C₁-C₄ alkyl group, optionally substituted with one or more—OH groups or OR₁₃ (which can readily cleave to form the desired BF₄ ⁻complex), wherein R₁₃ is a C₁-C₉ alkyl or aryl group. Suitable estersinclude those formed with salicyclic acid or acetic acid. Other cyclicborates include CH₃B₃O₃ which hydrolyze rapidly in water.

The presence of BF₄ ⁻ controls the concentration of active HF at anygiven time. As a result, the formation of calcium and magnesiumfluoride, sodium or potassium fluorosilicate, or fluoroaluminate scalesis prevented or inhibited.

Typically, the amount of boron containing compound in the well treatingcomposition is that sufficient to impart to the composition between fromabout 0.5 to about 10 g of BF₄ ⁻ complex per 100 cc of phosphonate,hydrofluoric acid source and water.

The hydrofluoric acid source, useful in the formation of the BF₄ ⁻complex may be hydrofluoric acid. More typically, however, thehydrofluoric acid source is the combination of a mineral acid andammonium bifluoride or ammonium fluoride. Reaction of the acid with theammonium bifluoride or ammonium fluoride renders HF. The use of thecombination of acid and ammonium bifluoride or ammonium fluoride andboric acid to control hydrogen fluoride significantly slows thehydrofluoric acid reaction rate.

Preferred as the acid is hydrochloric acid, though other acids such ascitric, chloroacetic, methanesulfonic, sulfuric, sulfamic, nitric,acetic, lactic, fumaric and formic acid may also be used. Preferredorganic acids include citric acid, acetic acid and formic acid. Aretarder may also be used, such as an aluminum salt.

In the reaction, ammonium bifluoride or ammonium fluoride hydrolyzes andis converted to hydrofluoric acid. When ammonium bifluoride or ammoniumfluoride is used as a source of hydrofluoric acid, typically less acidis present than is necessary to hydrolyze all of the ammonium bifluorideor ammonium fluoride. Thus, there remains some unconverted ammoniumbifluoride or ammonium fluoride in the composition.

The hydrofluoric acid source of the aqueous well treatment compositiongenerally provides between from about 0.25 to about 10, typicallybetween from about 1.0 to about 6.0, weight percent of hydrofluoric acidto the well treatment composition (based on the total weight of the welltreatment composition).

When present, the well treatment composition may further contain betweenfrom about 1 to about 50 weight percent of organic acid, preferablyabout 10 weight percent based on the total weight of the well treatmentcomposition.

The phosphonate compound may be a polyphosphonic acid and their saltsand esters and is preferably a phosphonate acid, salt or ester thereof.Preferred are phosphonate materials of the formula:

wherein R1, R2 and R3 are independently selected from hydrogen, alkyl,aryl, phosphonic, phosphonate, phosphate, aminophosphonic,aminophosphonate, acyl, amine, hydroxy and carboxyl groups and saltsthereof and R4 and R5 are independently selected from hydrogen, sodium,potassium, ammonium or an organic radical. Preferred organic radicalsare C_(n)H_(2n+1) wherein n is between from 1 to about 5.

Preferred as R1, R2 and R3 are aminophosphonate and aminophosphonicgroups which may optionally be substituted with alkyl, phosphonic,aminophosphonic, phosphate and phosphonate groups.

Examples of preferred phosphonate acids, esters or salts includeaminotri (methylene phosphonic acid) and its pentasodium salt,1-hydroxyethylidene-1,1-diphosphonic acid and its tetrasodium salt,hexamethylenediaminetetra (methylene phosphonic acid) and itshexapotassium salt, and diethylenetriaminepenta (methylene phosphonicacid) and its hexasodium salt. Among the commercial phosphonatematerials, preferred is 1-hydroxyethylidene-1,1-diphosphonic acid,available as DEQUEST 2010 and diethylenediamine penta (methylenephosphonic) acid, commercially as DEQUEST 2060S, both available fromSolutia, Inc. in 60% strength.

In general, the phosphonic acids are more preferred over the saltderivatives. Thus, in formula (III) above, both R4 and R5 are moredesirably —H versus the stated salt derivatives. Also preferred arethose phosphonic acid salts which generate the corresponding phosphonicacid in-situ in the presence of a slight amount of strong acid, such asHCl.

The amount of phosphonate in the well treatment composition is generallybetween from about 0.1 to about 10, preferably from about 0.25 to about6, more preferably from about 0.5 to about 3, percent by volume based onthe total volume of water, phosphonate and hydrofluoric acid source.

The well treatment composition has a pH greater than or equal to 0.5 andthus is much less corrosive than the acid systems of the prior artincluding those disclosed in U.S. Pat. Nos. 2,663,689; 2,961,355; and4,330,419. Enough acid should be used to maintain the pH of the aqueousHF solution and to hydrolyze ammonium fluoride or bifluoride, if it isused. The pH of the composition is typically maintained at a range of0.5 to 2.5. Maintenance of the desired pH range aids in the inhibitionof inorganic scales and in most instances the prevention of formation ofsuch scales.

Other materials commonly added to acid treatment solutions may alsooptionally be added to the well treatment composition herein. Forexample, the composition may include or have added thereto corrosioninhibitors, surfactants, iron control agents, non-emulsifiers, foamingagents, water-wetting surfactants, anti-sludge agents, mutual solventsor alcohols (such as methanol or isopropanol), gelling agents,bactericides, clay stabilizers or fluid loss control agents. The amountof such additives, when employed, is typically between from about 0.1 toabout 2 weight percent. When mutual solvents or alcohols are employed,they are typically used in amounts between from about 1 to about 20weight percent of the well treatment composition.

The well treatment composition is introduced into the formation at thelocation where treatment is desired. The well treatment composition maybe applied after treatment of the formation with a pre-flush.

The well treatment composition of the invention enhances the productionof hydrocarbons from hydrocarbon bearing calcareous or siliceousformations. The treatment method is especially effective if appliedprior to gravel packing or fracturing.

The well treatment composition may easily be applied in the stimulationof sandstone formations containing calcareous materials and calcareousformations such as carbonate or dolomite. In addition to its use inmatrix acidizing, it may be used in acid fracturing as well aspre-fracturing treatment on sandstone, carbonate and dolomiteformations. They may also be used for remedial workovers of wells tokeep silicates in suspension and to remove clay, fine and sand depositsas well as inorganic scales from downhole screens and from drillingfluid damage. The well treatment composition is capable of dissolvingcarbonates, as well as siliceous minerals, while minimizing theformation of calcium fluoride and magnesium fluoride or sodium orpotassium fluorosilicate or fluoroaluminate.

Such well treatments may be simplified by use of the well treatmentcomposition defined herein since the need to pump multiple fluids in acarefully choreographed sequence is eliminated. Further, acid placementand distribution is improved and equipment requirements are reduced,e.g., in terms of tankage, etc. Use of the well treatment compositionimproves logistics, reduces costs, along with improved results, whilesimultaneously rendering treatments which are easier to implement andcontrol at the field level.

In addition to preventing and/or inhibiting the formation of inorganicscales in subterranean formation, the well treatment composition mayfurther be employed in the remediation of oil and gas and geothermalwells by preventing and/or inhibiting the formation of unwanted depositson the surfaces of the wellbore, downhole assembly, sand controlscreens, production equipment and pipelines. Such unwanted deposits formand/or accumulate in the wellbore, production equipment, recoveryequipment and well casing. Such accumulated deposits affect productivityand are typically removed prior to cementing or the introduction ofcompletion fluids into the wellbore. Remediation treatment fluids arefurther typically used to remove such undesired deposits prior to theintroduction of stimulation fluids or to restore well productivity fromthe undesired deposits. In a preferred embodiment, the invention is usedto remove siliceous or calcareous deposits inside well tubulars. Thewell treatment composition may also be used to treat pipelines fromundesired deposits.

In well remediation applications, the well treatment composition ispreferably injected directly into the wellbore through the productiontubing or through the use of coiled tubing or similar deliverymechanisms. Once downhole, the composition remedies damage caused duringwell treating such as, for instance, by stimulation fluids and drillingfluid muds, by dispersing and removing siliceous materials from theformation and wellbore.

The following examples are illustrative of some of the embodiments ofthe present invention. Other embodiments within the scope of the claimsherein will be apparent to one skilled in the art from consideration ofthe description set forth herein. It is intended that the specification,together with the examples, be considered exemplary only, with the scopeand spirit of the invention being indicated by the claims which follow.

All percentages set forth in the Examples are given in terms of volumepercent except as may otherwise be indicated.

EXAMPLES Examples 1-6

Analytical grade carbonate powder was exposed to an aqueous hydrofluoricacid solution at 70° F. The un-dissolved solid or precipitate wasanalyzed by X-ray diffraction technique (XRD). Table 1 presents theresults of these tests wherein pH A represents the pH at the beginningof the testing and pH B represents the pH at the end of the testing.

TABLE 1 Ex. No. Composition pH A pH B CaCO₃ added Comments Comp. HF acid2.2 2.2 0.4 g/100 cc All carbonate Ex. 1 dissolved and CaF₂ precipitateformed within 5 minutes. Comp. HF acid 1.9 1.9 0.4 g/100 cc Allcarbonate Ex. 2 3% Dequest 2010 dissolved and CaF₂ precipitate formedwithin 5 minutes. Comp. HF acid 2.2 >4.0 0.4 g/100 cc All carbonate Ex.3 2.8 g/100 cc Boric acid dissolved and CaF₂ precipitate formed within 5minutes. 4 HF acid 1.6 1.6 0.4 g/100 cc All carbonate 3% Dequest 2010dissolved and 2.8 g/100 cc Boric acid no precipitate formed over 4hours. 5 HF acid 1.6 1.6 1.0 g/100 cc All carbonate 3% Dequest 2060Sdissolved and 4.2 g/100 cc Boric acid no precipitate formed over 24hours. 6 HF acid 1.6 1.6 1.0 g/100 cc All carbonate 1.5% Dequest 2010dissolved and 1.5% Dequest 2060S no precipitate 4.2 g/100 cc Boric acidformed over 24 hours.

Example 7

The dissolution effect of the compositions of Examples 1-6 wasillustrated on a formation containing calcareous minerals as follows. Acomposition consisting of 75 wt. % quartz, 5 wt. % kaolinite, 10 wt. %potassium-feldspar and 10 wt. % calcium carbonate (powder) was prepared.The composition was tested for its solubility in a HF acid at 150° F.over 4 and 24 hrs. After solubility testing, the un-dissolved solid orprecipitate was analyzed. The experimental conditions and results areset forth in Tables 2-5. Table 2 represents the 4 hour solubilitytesting of the formation composition at 150° F. Tables 3-5 represent the4 and 24 hour solubility testing of the formation composition at 150° F.

TABLE 2 HF acid HF acid 3% Dequest 3% Dequest HF acid HF acid 2010 HFacid 2060S 3% Dequest 2.8 g/100 cc 2.8 g/100 cc 3% Dequest 2.8 g/100 ccBoric Acid 2010 Boric acid Boric acid 2060S acid pH 1.9/1.9 2.2/5.51.6/1.9 1.6/1.6 1.0/1.3 before/after Solubility, % 14.9 4.4 14.4 14.79.6 Quartz 87 79 91 89 88 Plagioclase nd 1 1 nd 1 K-feldspar 4 7 6 2 6Kaolinite nd 2 nd nd 2 Calcite 1 1 1 tr 1 CaF₂ 7 9 <0.5 8 1 K₂SiF₆ tr ndnd nd nd Notes: nd—not detected and tr—trace.

TABLE 3 Acid HF acid HF acid 7.5% Dequest 2010 7.5% Dequest 2010 22.5%Dequest 2060S 22.5% Dequest 2060S 2.8 g/100 cc Boric acid Time, Hrs 4 244 24 pH before/after 1.6/1.6 1.6/1.6 1.3/1.6 1.3/1.6 Solubility, %  13.4 20.8  11.9  12.2 Quartz 89  91  90  91  Plagioclase nd nd 1 1K-feldspar 3 nd 6 6 Kaolinite nd nd 1 nd Calcite tr nd 1 1 CaF₂ 7 8 ndnd K₂SiF₆ tr tr nd nd Notes: nd—not detected and tr—trace.

TABLE 4 Acid HF acid HF acid 1.5% Dequest 2010 1.5% Dequest 2010 1.5%Dequest 2060S 1.5% Dequest 2060S 2.8 g/100 cc Boric acid Time, Hrs 4 244 24 pH before/after 1.9/1.6 1.9/1.6 1.3/1.6 1.3/1.6 Solubility, %  13.8 24.6  12.0  15.4 Quartz 90  90  90  92  Plagioclase nd nd 1 trK-feldspar 2 nd 6 6 Kaolinite nd nd 1 nd Calcite tr nd tr tr CaF₂ 7 9 11 K₂SiF₆ tr tr nd nd Notes: nd—not detected and tr—trace.

TABLE 5 Acid 3% HF HF acid 22.5% Dequest 2010 22.5% Dequest 2010 7.5%Dequest 2060S 7.5% Dequest 2060S 2.8 g/100 cc Boric acid Time, Hrs 4 244 24 pH before/after 1.6/1.6 1.6/1.6 1.3/1.6 1.3/1.6 Solubility, %  13.9  22.8  12.1  15.3 Quartz 89  89 90  90  Plagioclase nd nd 1 1K-feldspar 2 tr 5 5 Kaolinite nd nd tr nd Calcite tr nd 1 1 CaF₂ 8 10 22 K₂SiF₆ tr tr nd nd Notes: nd—not detected and tr—trace.

Tables 2-5 demonstrate that the well treatment compositions definedherein can control or minimize the formation of inorganic fluoridescales, such as calcium fluoride, in the hydrofluoric acid.

From the foregoing, it will be observed that numerous variations andmodifications may be effected without departing from the true spirit andscope of the novel concepts of the invention.

1. A method of removing inorganic or siliceous scales fromhydrocarbon-producing wellbores and/or downhole screens which comprises:(A) pumping into the wellbore a well treatment composition comprising:a) a boron containing compound selected from the group consisting of(i.) fluoroboric acid and/or (ii.) boron compounds capable of forming aBF₄ ⁻ complex when exposed to F₄ ⁻ or a hydrofluoric acid source; (b) aphosphonate acid, ester or salt thereof, wherein the phosphonate is ofthe formula:

wherein R1, R2 and R3 are independently selected from hydrogen, alkyl,aryl, phosphonic, phosphonate, phosphate, aminophosphonic acid,aminophosphonate, acyl, amine, hydroxy and carboxyl groups and R4 and R5are independently selected from hydrogen, sodium, potassium, ammonium oran organic radical; and (c) a hydrofluoric acid source; (B) forming aBF₄ ⁻ complex; and (C) removing inorganic or siliceous scales from thehydrocarbon-producing wellbore and/or downhole screen.
 2. The method ofclaim 1, wherein the pH of the well treatment composition is betweenfrom about 0.5 to about 2.5.
 3. The method of claim 1, wherein theinorganic or siliceous scales are selected from the group consisting ofcalcium fluoride, magnesium fluoride, sodium fluorosilicate, potassiumfluorosilicate and fluoroaluminate.
 4. The method of claim 1, whereinthe well treatment composition further comprises at least one memberselected from the group consisting of corrosion inhibitors, mutualsolvents, alcohols, iron control agents, non-emulsifiers, claystabilizers and water-wetting surfactants.
 5. The method of claim 1,wherein the amount of phosphonate acid, ester or salt thereof in theaqueous well treating composition is between from about 0.1 to about 10percent by volume based on the total volume of (b) and (c) and water. 6.The method of claim 1, wherein the boron containing compound is of theformula R₆R₇R₈BO₃ wherein each of R₆, R₇ and R₈ are independentlyhydrogen or a unsubstituted or substituted alkyl or alkylene group. 7.The method of claim 6, wherein each of R₆, R₇ and R₈ is independentlyselected from hydrogen or C₁-C₄ alkyl group, optionally substituted withone or more —OH groups.
 8. The method of claim 1, wherein the boroncontaining compound is of the formula:

wherein each of R₉, R₁₀, R₁₁, R₁₂, R₁₃, R₁₄, R₁₅ and R₁₆ isindependently selected from hydrogen or a substituted or unsubstitutedalkyl or alkenyl group.
 9. The method of claim 8, wherein each of R₉,R₁₀, R₁₁, R₁₂, R₁₃, R₁₄, R₁₅ and R₁₆ is independently selected fromhydrogen or a C₁-C₄ alkyl group, optionally substituted with one or more—OH groups.
 10. The method of claim 1, wherein the boron containingcompound is boric acid or a salt thereof.
 11. The method of claim 1,wherein the amount of boron containing compound in the aqueous welltreatment composition is that sufficient to render between from about0.5 to about 10 g BF₄ ⁻ complex per 100 cc of (b), (c) and water. 12.The method of claim 1, wherein the aqueous well treatment composition isintroduced into the wellbore during a fracturing operation.
 13. Themethod of claim 1, wherein the aqueous well treatment composition isintroduced into the wellbore during a remedial workover operation. 14.The method of claim 1, wherein the aqueous well treatment composition isintroduced into the wellbore during a matrix acidizing operation. 15.The method of claim 1, wherein the inorganic or siliceous scales areselected from the group consisting of calcium fluoride, magnesiumfluoride, sodium fluorosilicate, potassium fluorosilicate andfluoroaluminate.
 16. The method of claim 1, wherein the phosphonateacid, ester or salt thereof is selected from the group consisting ofaminotri (methylene phosphonic acid) and its esters and pentasodiumsalt, 1-hydroxyethylidene-1,1-diphosphonic acid and its esters andtetrasodium salt, hexamethylenediaminetetra (methylene phosphonic acid)and its esters and hexapotassium salt, diethylenetriaminepenta(methylene phosphonic acid) and its hexasodium salt anddiethylenediamine penta (methylene phosphonic) acid and its esters andsodium salt.
 17. The method of claim 16, wherein the phosphonate acid,ester or salt thereof is selected from the group consisting of aminotri(methylene phosphonic acid), 1-hydroxyethylidene-1,1-diphosphonic acid,hexamethylenediaminetetra (methylene phosphonic acid),diethylenetriaminepenta (methylene phosphonic acid) anddiethylenediamine penta (methylene phosphonic) acid.
 18. The method ofclaim 17, wherein the phosphonate acid, acid, ester or salt thereof isselected from the group consisting of1-hydroxyethylidene-1,1-diphosphonic acid and diethylenediamine penta(methylene phosphonic) acid.
 19. The method of claim 1, wherein thehydrofluoric acid source provides between from about 0.25 to about 10weight percent of HF to the well treatment composition.
 20. The methodof claim 1, wherein the formation contains dolomite.
 21. A method ofremoving inorganic or siliceous scales from hydrocarbon-producingwellbores, well casings, downhole assembly, downhole screens, productionequipment, recovery equipment, well tubular or pipelines whichcomprises: (A) pumping into the wellbore, well casing, downholeassembly, downhole screen, production equipment, recovery equipment,well tubular or pipeline an aqueous well treatment compositioncomprising: (a) a boron containing compound selected from the groupconsisting of (i.) fluoroboric acid and/or (ii.) boron compounds capableof forming a BF₄ ⁻ complex when exposed to F₄ ⁻ or a hydrofluoric acidsource; (b) a phosphonate acid, ester or salt thereof, wherein thephosphonate is of the formula:

wherein R1, R2 and R3 are independently selected from hydrogen, alkyl,aryl, phosphonic, phosphonate, phosphate, aminophosphonic acid,aminophosphonate, acyl, amine, hydroxy and carboxyl groups and R4 and R5are independently selected from hydrogen, sodium, potassium, ammonium oran organic radical; and (c) a hydrofluoric acid source; (B) forming aBF₄ ⁻ complex; and (C) removing inorganic or siliceous scales from thewellbore, well casing, downhole assembly, downhole screen, productionequipment, recovery equipment, well tubular or pipeline.
 22. The methodof claim 21, wherein the aqueous well treatment composition isintroduced into the wellbore during a remedial workover operation. 23.The method of claim 21, wherein the aqueous well treatment compositionis introduced into the wellbore during a matrix acidizing operation. 24.A method of removing calcium fluoride, magnesium fluoride, sodiumfluorosilicate, potassium fluorosilicate and/or fluoroaluminate scalesfrom hydrocarbon-producing wellbores and/or downhole screens whichcomprises: (A) pumping into the wellbore a well treatment compositionhaving a pH between from about 0.5 to about 2.5 and comprising: a) aboron containing compound selected from the group consisting of (i.)fluoroboric acid and/or (ii.) boron compounds capable of forming a BF₄ ⁻complex when exposed to F₄ ⁻ or a hydrofluoric acid source; (b) aphosphonate acid, ester or salt thereof, wherein the phosphonate is ofthe formula:

wherein R1, R2 and R3 are independently selected from hydrogen, alkyl,aryl, phosphonic, phosphonate, phosphate, aminophosphonic acid,aminophosphonate, acyl, amine, hydroxy and carboxyl groups and R4 and R5are independently selected from hydrogen, sodium, potassium, ammonium oran organic radical; and (c) a hydrofluoric acid source; (B) forming aBF₄ ⁻ complex; and (C) removing inorganic or siliceous scales from thehydrocarbon-producing wellbore and/or downhole screen.